Advanced semiconductor lithography / George J. Hefferon, guest editor
Сохранено в:
| Вид документа: | |
|---|---|
| Опубликовано: | Armonk, NY : International Business Machines Corporation , 2001 |
| Физические характеристики: |
С. [2], 603―760 : іл. ; 28 см
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| Язык: | Английский |
| Серия: |
IBM journal of research and development
vol. 45, № 5 |
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