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00000nam2a22000003is4500 |
| 001 |
BY-NLB-br0001709821 |
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20210730161929.0 |
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$a 20210730d1997 |||y0bely50 ba
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| 101 |
0 |
# |
$a eng
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| 102 |
# |
# |
$a US
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| 105 |
# |
# |
$a a ||||000yy
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| 200 |
1 |
# |
$a Papers on optical lithography
$f [guest editors: G. L.-T. Chiu, J. M. Shaw]
|
| 210 |
# |
# |
$a Armonk, NY
$c International Business Machines Corporation
$d 1997
|
| 215 |
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# |
$a 200 с.
$c іл.
$d 28 см
|
| 225 |
2 |
# |
$a IBM journal of research and development
$x 0018-8646
$v vol. 41, № 1/2
|
| 320 |
# |
# |
$a Бібліяграфія ў канцы артыкулаў
|
| 461 |
# |
1 |
$1 001BY-NLB-br293301
$1 2001
$v 1997,Vol.41,№1/2
|
| 517 |
0 |
# |
$a Optical lithography
|
| 702 |
# |
1 |
$a Chiu
$b G. L.-T.
$4 340
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| 702 |
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1 |
$a Shaw
$b J. M.
$4 340
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| 801 |
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$b BY-HM0000
$c 20210730
$g RCR
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